Citation: Tao Zhang, Qian-wen Dong, Wei Zhang, Jie Wei. PREPARATION AND APPLICATION OF PHOTOSENSITIVE COPOLYMERS FOR PDP BARRIER RIBS FORMED BY PHOTOLITHOGRAPHY[J]. Chinese Journal of Polymer Science, ;2013, 31(3): 444-451. doi: 10.1007/s10118-013-1232-9 shu

PREPARATION AND APPLICATION OF PHOTOSENSITIVE COPOLYMERS FOR PDP BARRIER RIBS FORMED BY PHOTOLITHOGRAPHY

  • Corresponding author: Jie Wei, 
  • Received Date: 11 May 2012
    Revised Date: 7 August 2012

    Fund Project: This work was financially supported by Beijing Municipal Natural Science Foundation (No. 2102035) and National Natural Science Foundation of China (No. 51173013).

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