Citation:
FANG Yuee, CHEN Dapeng, LIU Gang, WANG Bing, SHI Tianyi, HU Yiguan, TIAN Yangchao, KAN Ya. COPOLYMERS OF CHLOROETHYL METHACRYLATE, GLYCIDYL METHACRYLATE, AND METHYL METHACRYLATE AS SYNCHROTRON RADIATION x-RAY PHOTORESISTS*[J]. Chinese Journal of Polymer Science,
1998, 16(4): 304-309.
COPOLYMERS OF CHLOROETHYL METHACRYLATE, GLYCIDYL METHACRYLATE, AND METHYL METHACRYLATE AS SYNCHROTRON RADIATION x-RAY PHOTORESISTS*
摘要:
The copolymers of chloroethyl methacrylate (CMA), glycidyl methacry-late (GMA), and methyl methacrylate (MMA) were synthesized in benzene solution. Theirbreadths of the molecular weight distributions are 2.1 and 2.3, respectively The ther-mal stability of P(GMA-CMA) is superior to that of P(CMA-MMA). The resolutionsof P(CMA-MMA) and P(GMA-CMA) photoresists were found to be 0.1～0.16μm and0.17 ～0.2μm, respectively.
English
COPOLYMERS OF CHLOROETHYL METHACRYLATE, GLYCIDYL METHACRYLATE, AND METHYL METHACRYLATE AS SYNCHROTRON RADIATION x-RAY PHOTORESISTS*
Abstract:
The copolymers of chloroethyl methacrylate (CMA), glycidyl methacry-late (GMA), and methyl methacrylate (MMA) were synthesized in benzene solution. Theirbreadths of the molecular weight distributions are 2.1 and 2.3, respectively The ther-mal stability of P(GMA-CMA) is superior to that of P(CMA-MMA). The resolutionsof P(CMA-MMA) and P(GMA-CMA) photoresists were found to be 0.1～0.16μm and0.17 ～0.2μm, respectively.
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